ÜZÜM, A. And Kanmaz, I. 2021. Passivation properties of HfO2-SiO2 mixed metal oxide thin films with low reflectivity on silicon substrates for semiconductor devices. Thin Solid Films , vol.738 .

ÜZÜM, A., & Kanmaz, I., (2021). Passivation properties of HfO2-SiO2 mixed metal oxide thin films with low reflectivity on silicon substrates for semiconductor devices. Thin Solid Films , vol.738.

ÜZÜM, ABDULLAH, And Imran Kanmaz. "Passivation properties of HfO2-SiO2 mixed metal oxide thin films with low reflectivity on silicon substrates for semiconductor devices," Thin Solid Films , vol.738, 2021

ÜZÜM, ABDULLAH And Kanmaz, Imran. "Passivation properties of HfO2-SiO2 mixed metal oxide thin films with low reflectivity on silicon substrates for semiconductor devices." Thin Solid Films , vol.738, 2021

ÜZÜM, A. And Kanmaz, I. (2021) . "Passivation properties of HfO2-SiO2 mixed metal oxide thin films with low reflectivity on silicon substrates for semiconductor devices." Thin Solid Films , vol.738.

@article{article, author={ABDULLAH ÜZÜM And author={Imran Kanmaz}, title={Passivation properties of HfO2-SiO2 mixed metal oxide thin films with low reflectivity on silicon substrates for semiconductor devices}, journal={Thin Solid Films}, year=2021}