Current transport mechanism in CdS thin films prepared by vacuum evaporation method at substrate temperatures below room temperature
THIN SOLID FILMS, cilt.520, sa.7, ss.2532-2536, 2012 (SCI-Expanded, Scopus)
- Yayın Türü: Makale / Tam Makale
- Cilt numarası: 520 Sayı: 7
- Basım Tarihi: 2012
- Doi Numarası: 10.1016/j.tsf.2011.10.160
- Dergi Adı: THIN SOLID FILMS
- Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
- Sayfa Sayıları: ss.2532-2536
- Anahtar Kelimeler: CdS, Thin films, Vacuum evaporation, Electrical properties and measurements, X-ray diffraction, ELECTRICAL-PROPERTIES, OPTICAL-PROPERTIES, CONDUCTION, THICKNESS, PHOTOCONDUCTIVITY, SEMICONDUCTORS, SULFIDE, SILICON
- Karadeniz Teknik Üniversitesi Adresli: Evet
Özet
CdS thin films were deposited by vacuum deposition method at low substrate temperatures instead of the commonly used vacuum deposition at high substrate temperatures (T-S > 300 K). The effect of low substrate temperature on the current transport mechanisms in polycrystalline CdS thin films has been studied as a function of temperature over the temperature range 100-300 K. Both thermally assisted tunneling of carriers through and thermionic emission over the grain boundary potential have contributions to the conduction in the range 250-300 K for the sample prepared at 300 K substrate temperature. The dominant conduction mechanism of the samples prepared at 200 K and 100 K is determined as thermionic emission over 200 K and Mott's hopping process below 200 K. The Mott's hopping process is not applicable for the sample prepared at 300 K. (C) 2011 Elsevier B.V. All rights reserved.