Effect of increased exposure times on amount of residual monomer released from single-step self-etch adhesives

Altunsoy M., BOTSALI M. S., Tosun G., YAŞAR A.

JOURNAL OF APPLIED BIOMATERIALS & FUNCTIONAL MATERIALS, cilt.13, sa.3, 2015 (SCI-Expanded) identifier identifier identifier

  • Yayın Türü: Makale / Tam Makale
  • Cilt numarası: 13 Sayı: 3
  • Basım Tarihi: 2015
  • Doi Numarası: 10.5301/jabfm.5000235
  • Dergi Adı: JOURNAL OF APPLIED BIOMATERIALS & FUNCTIONAL MATERIALS
  • Derginin Tarandığı İndeksler: Science Citation Index Expanded (SCI-EXPANDED), Scopus
  • Anahtar Kelimeler: Bis-GMA, Dental bonding, HEMA, Polymerization, TEGDMA, UDMA, LIGHT-INTENSITY, DENTAL RESINS, HPLC ANALYSIS, CONVERSION, COMPONENTS, COMPOSITES, RINSE, FIBROBLASTS, ELUTION, TEGDMA
  • Karadeniz Teknik Üniversitesi Adresli: Evet

Özet

Background: The aim of this study was to evaluate the effect of increased exposure times on the amount of residual Bis-GMA, TEGDMA, HEMA and UDMA released from single-step self-etch adhesive systems.